Masterclass Certificate in Plasma Ashing for Microelectronics
-- ViewingNowThe Masterclass Certificate in Plasma Ashing for Microelectronics is a comprehensive course that provides learners with critical skills in plasma etching and deposition techniques. This certification is essential in the microelectronics industry, where precision and advanced knowledge in plasma processing are highly demanded.
4,972+
Students enrolled
GBP £ 140
GBP £ 202
Save 44% with our special offer
ě´ ęłźě ě ëí´
100% ě¨ëźě¸
ě´ëěë íěľ
ęłľě ę°ëĽí ě¸ěŚě
LinkedIn íëĄíě ěśę°
ěëŁęšě§ 2ę°ě
죟 2-3ěę°
ě¸ě ë ěě
ë기 ę¸°ę° ěě
ęłźě ě¸ëśěŹí
⢠Introduction to Plasma Ashing: Basics of plasma etching, principles of plasma chemistry, and its applications in microelectronics.
⢠Fundamentals of Plasma Physics: Understanding of plasma properties, generation, and behavior in a controlled environment.
⢠Plasma Ashing System Design: Design and construction of plasma ashing systems, including safety measures and vacuum technology.
⢠Materials Interaction in Plasma Ashing: Analysis of plasma-material interactions, including polymer degradation, residue removal, and etching profiles.
⢠Advanced Plasma Ashing Techniques: Deep dive into advanced plasma ashing techniques, such as high-density plasmas and remote plasmas.
⢠Process Control and Monitoring: Process control strategies, monitoring techniques, and data analysis in plasma ashing.
⢠Cleanroom Standards and Practices: Cleanroom requirements, handling of microelectronic components, and safety protocols.
⢠Industrial Applications of Plasma Ashing: Real-world applications, benefits, and challenges of plasma ashing in the microelectronics industry.
⢠Environmental, Health, and Safety Considerations: Understanding of regulatory requirements, waste management, and environmental impact of plasma ashing.
ę˛˝ë Ľ 경ëĄ
ě í ěęą´
- 죟ě ě ëí 기본 ě´í´
- ěě´ ě¸ě´ ëĽěë
- ěť´í¨í° ë° ě¸í°ëˇ ě ꡟ
- 기본 ěť´í¨í° 기ě
- ęłźě ěëŁě ëí íě
ěŹě ęłľě ěę˛Šě´ íěíě§ ěěľëë¤. ě ꡟěąě ěí´ ě¤ęłë ęłźě .
ęłźě ěí
ě´ ęłźě ě ę˛˝ë Ľ ę°ë°ě ěí ě¤ěŠě ě¸ ě§ěęłź 기ě ě ě ęłľíŠëë¤. ꡸ę˛ě:
- ě¸ě ë°ě 기ę´ě ěí´ ě¸ěŚëě§ ěě
- ęśíě´ ěë 기ę´ě ěí´ ęˇě ëě§ ěě
- ęłľě ě겊ě ëł´ěě
ęłźě ě ěąęłľě ěźëĄ ěëŁí늴 ěëŁ ě¸ěŚě뼟 ë°ę˛ ëŠëë¤.
ě ěŹëë¤ě´ ę˛˝ë Ľě ěí´ ě°ëŚŹëĽź ě ííëę°
댏롰 ëĄëŠ ě¤...
ě죟 돝ë ě§ëʏ
ě˝ě¤ ěę°ëŁ
- 죟 3-4ěę°
- 쥰기 ě¸ěŚě ë°°ěĄ
- ę°ë°Ší ëąëĄ - ě¸ě ë ě§ ěě
- 죟 2-3ěę°
- ě 기 ě¸ěŚě ë°°ěĄ
- ę°ë°Ší ëąëĄ - ě¸ě ë ě§ ěě
- ě 체 ě˝ě¤ ě ꡟ
- ëě§í¸ ě¸ěŚě
- ě˝ě¤ ěëŁ
ęłźě ě ëł´ ë°ę¸°
íěŹëĄ ě§ëś
ě´ ęłźě ě ëšěŠě ě§ëśí기 ěí´ íěŹëĽź ěí ě˛ęľŹě뼟 ěě˛íě¸ě.
ě˛ęľŹěëĄ ę˛°ě ę˛˝ë Ľ ě¸ěŚě íë